<b>Use of the optical lithography in the development of disposable carbon based electrodes</b> - doi: 10.4025/actascitechnol.v35i1.11915

Autores

  • Lucilene Dornelles Mello Universidade Federal do Pampa
  • Alexandre Kisner Universidade Estadual de Campinas
  • Arnaldo Pereira Universidade Estadual de Campinas
  • Lauro Tatsuo Kubota Universidade Estadual de Campinas

DOI:

https://doi.org/10.4025/actascitechnol.v35i1.11915

Palavras-chave:

optical lithography, carbon-paste electrode, cyclic voltammetric

Resumo

In this study, carbon-based electrodes for disposable use were constructed using the technique of optical lithography. The process consisted in the irradiation of UV light on a layer of photosensitive resin (SU-8 50) deposited on a substrate of PVC. The pattern obtained electrode was filled with carbon paste. The electrodes were characterized by cyclic voltammetric using the reversible system Fe(CN)63-/Fe(CN)64- in KCl 0.1 mol L-1 and electrochemical impedance spectroscopy (EIS). The electrodes showed an E°´ = ½ (Epa + Epc) » 229 (± 2) mV vs SCE (n = 4), with DEp » 235 (± 14) mV (n = 4). Other studies showed a linear behavior of the peak current (Ip) both anode and cathode with v1/2, probably due to diffuse contribution and/or electron transfer kinetics of the reaction. These parameters are in accordance to with those obtained for screen-printed electrode described in the literature. The good results obtained show the suitability of the electrodes for analytical applications such as development of sensors.

 

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Biografia do Autor

Lucilene Dornelles Mello, Universidade Federal do Pampa

Írea de Quí­mica Analí­tica

Publicado

2012-08-27

Como Citar

Mello, L. D., Kisner, A., Pereira, A., & Kubota, L. T. (2012). <b>Use of the optical lithography in the development of disposable carbon based electrodes</b> - doi: 10.4025/actascitechnol.v35i1.11915. Acta Scientiarum. Technology, 35(1), 147–152. https://doi.org/10.4025/actascitechnol.v35i1.11915

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Quí­mica

 

0.8
2019CiteScore
 
 
36th percentile
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0.8
2019CiteScore
 
 
36th percentile
Powered by  Scopus